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New Method Of Obtaining Titanium Carbide Flakes

wallpapers News 2020-11-13
MXenes metals are conductive and hydrophilic, so they are the best choice for electrodes in rechargeable batteries and supercapacitors. They are also widely used in other areas, such as photothermal cancer treatment, electromagnetic shielding, water purification and gas induction. In Angewandte Chemie magazine, researchers introduced a new production method. Putting aside the traditional and expensive titanium aluminum carbide, silicon is selectively etched from titanium silicon carbide (a cheaper and more common titanium carbide compound) to obtain titanium carbide.
 
Compared with ordinary three-dimensional materials, two-dimensional materials composed of extremely thin layers of several atoms have completely different special properties. The most typical two-dimensional material is graphene, which is composed of a single layer of carbon atoms. In 2011, Drexel University in Philadelphia (Pennsylvania, USA) synthesized a new two-dimensional material. This material is MXenes, which is synthesized from transition metal carbides and nitrides, where M represents a transition metal, such as titanium, vanadium or molybdenum, and X represents carbon or nitrogen, and there are a variety of synthetic components to choose from (about 30 The components have been experimentally proven, and there are expected to be dozens more). One type of MXene is titanium carbide Ti3C2.
 

Obtaining the required MXene usually involves a circuitous process: selective etching of the MAX phase layered carbides and nitrides with hydrofluoric acid to remove the layer of "A" elements, which are elements of the 13 or 14 main group, For example, aluminum, silicon, germanium. In this way, titanium carbide can be obtained by etching out the aluminum in titanium aluminum carbide (Ti3C2). However, this raw material is expensive and its production is complicated. But silicon-based materials can be bought at a cheap price, such as titanium silicon carbide (Ti3SiC2). Ti3SiC2 is the first MAX phase that Drexel researchers tried to selectively etch in 2011, but when using hydrofluoric acid etching, silicon atoms are tightly bonded to adjacent transition metal atoms, so the experiment failed.
 
A research team led by Drexel University Yury Gogotsi has successfully developed a variant of this process. The researchers added oxidants to weaken the silicon bond and oxygen-silicon bond. The team used hydrofluoric acid and an oxidant (such as a mixture of nitric acid, hydrogen peroxide, or potassium permanganate) to selectively remove silicon from Ti3SiC2 to produce titanium carbide MXene.
 
The etching process leaves a stack of titanium carbide, which can be layered to produce about 1 nanometer thick slices. Researchers use this method to produce large-scale titanium carbide conductive films.
 
This new method makes the production of MXenes easier and opens up a new path-the use of silicon-containing compound materials to produce new MXenes and related two-dimensional materials, while also expanding the two-dimensional applications that scientists and engineers can use. Nanosheet family.

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